晶圆研磨wafergrindingGDM300_OKAMOTO抛光减薄机
晶圆研磨wafergrindingGDM300_OKAMOTO抛光减薄机
产品价格:¥\u9762\u8bae(人民币)
  • 规格:完善
  • 发货地:上海上海
  • 品牌:
  • 最小起订量:1
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    认证类型:企业认证
    企业证件:通过认证

    商铺名称:上海衡鹏企业发展有限公司

    联系人:陈静静(小姐)

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    企业邮箱:lee.li@hapoin.com

    联系地址:上海市徐汇区田州路159号莲花大厦3楼B座

    邮编:200233

    联系我时,请说是在勒克斯之家上看到的,谢谢!

    商品详情
      产品参数
      品牌OKAMOTO
      英文名wafer grinding
      品名晶圆研磨
      别名晶圆抛光减薄机
      产地日本
      加工直径Ф300mm
      主轴转速范围0~3000rpm
      主轴驱动电机功率5.5/4 Kw/P
      主轴进给速度范围1~999μm/min
      主轴数2
      工作盘转速范围1~300rpm
      研磨轮尺寸Ф300mm
      重量8200kg
      可售卖地北京;天津;河北;山西;内蒙古;辽宁;吉林;黑龙江;上海;江苏;浙江;安徽;福建;江西;山东;河南;湖北;湖南;广东;广西;海南;重庆;四川;贵州;云南;西藏;陕西;甘肃;青海;宁夏;新疆
      类型全自动
      型号GDM300




      OKAMOTO GDM300晶圆研磨/晶圆抛光减薄机概要:
      Model GDM300 grinder is a fully automatic continuous downfeed grinding machine with dual polishing stations for increased throughput. Wafers are handled through the machine by a 6-axis robot, and load/unload arms designed for 25 um capability. An optional edge trimming system is recommended for eliminating edge chipping for thin wafers. Chuck speed, grinding wheel, and grind spindle downfeed rate speeds can be used to manipulate grinder throughput, surface finish, and wheel life.A two-point in-process gauge measuring system controls wafer thickness under grind spindles 1 and 2 with an optional laser detection for a more precision thickness accuracy (recommended for < 50 um). Programmable oscillating polish heads can be programmed to maintain wafer profile (ttv) in conjunction with with the optional motorized spindle angle adjustment.


      晶圆研磨/晶圆抛光减薄机GDM300特点:
      The process from back grinding to wafer mounting continuously by fully automatic system,
      With 2 head polishing stage, throughput is almost double compared with 1 polish head system.
      Built in edge trimming system is available as an option for thin wafer process.
      Dual index system, which polishing stage and grinding stage is completely separated,
      satisfy the cleanness required for TSV and MEMS process.
      Less than Ra1? ultra luminance, ultra mirror surface is possible.


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